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Near Edge X-ray Absorption NEXAFS (0.2-1.2keV) | SIMTRUM Photonics Store

Near Edge X-ray Absorption NEXAFS (0.2-1.2keV)

 proXAS

 table-top NEXAFS

 proXAS is the first system on the market to offer NEXAFS  measurements in a 

 laboratory.

 Fingerprinting for element analysis is now possible in-house with fast and 

 accurate  results.

 It combines a highly-reliable laser-based XUV source and a customized 

 spectrometer with an extremely high resolving power of 1900. 

 The energy range 200-1200eV allows for measurements at the K-edge of

 elements such as C, N, O, Ca, K, Ti.

image.jpg

Features

Integrated NEXAFS  system

 First integrated table-top NEXAFS spectroscopy solution

 No need to apply and wait for beamtime

 Chemical state analysis for geology, biology, materials 

    research

 Fast polychromatic acquisition

Synchrotron-quality spectra

 Energy range 200 to 1200eV

 High resolving power of 1900

 Extremely high surface sensitivity

 Information on molecular orbitals, oxidation 

    state, coordination number

 Software suite for spectra analysis

Applications

 Analysis of organic materials, e.g. 

    lipid membranes, humic acids,polymer 

    films, especially at carbon K-absorption 

    edge

 Surface-sensitive chemical analysis of C, N, 

    O, Ca, K, Ti

image.jpg


     NEXAFS spectrum at the carbon K-edge of a polyimide film 

        (t=200nm), measured with tabletop system, averaged over 

        60 pulses.

     Insert, NEXAFS spectrum recorded at a synchrotron for comparison.

     XUV light source using a highly-reliable laser produced plasma.

     Energy range  200-1200eV.

     Repetition rate 25Hz


    Results

image.jpg

   NEXAFS spectrum at the carbon K-edge of a polyimide film (t=200nm).

   (1) measured with the table-top system, averaging over 60 pulses.

   (2) NEXAFS spectrum recorded at a synchrotron for comparison


  Application

   Surface science

   Chemical state analysis in geochemistry

   Electronic structure and oxidation state analysis




Please check the table below for individual specifications

Product Brochure English:Near Edge X-ray Absorption Fine Structure

 Specifications
 Source debris-free laser-produced plasma XUV source
 Energy range 200-1200eV / 1-6nm
 Repetition rate 25Hz

 Source power stability

 ±1.5%
 Spectrometer aberration-corrected flat-field spectrometer
 Resolving power 1900
 Sample mount turret mount for multiple samples
 Footprint 1.5m x 1.0m
 Software suite integrated system control, variety of spectra calibration and analysis functions



Related UV Camera Options

Product
Model

maxCAM

easyCAM XF95
 Sensor

 back-illuminated CCD from e2v (grade 1),

 enhanced process, uncoated

front-illuminated CCD from e2v (grade 1), 

enhanced process

Back-illuminated sCMOS without Anti-reflection coating

Wavelength 1-100nm( Best QE) 50-300nm -
 Pixels  1024 x 255 * 2048 x 2048
 Pixel Size  26 x 26 um 11um x 11 um
 Image Area  26.7 x 6.7 mm 22.5mm x 22.5mm
 Spectral Rates  200/s full vertical bin, 1000/s crop mode 80-1000eV; 200 nm-1100nm
 Minimum Temperature  -60° C air cooled -50° C @20° C room temperature
 Well Depth

 500 000 e- active area,  1 000 000 eregister

90 000 e-

 Read Noise  12.5 etyp. at 500kHz 1.6 e- (Median)
 Dark Current  0.004 e- /px/s at -60°C -
 Linearity  >99% -
 Vacuum Compatibility  10-8mbar 10-7Pa(Max)

 

Related Spectrometer Product 

Product Model Wavelength (nm) Dispersion Resolution  
maxLIGHT Pro (XUV) 5 to 80 0.5 to   1.3nm/mm <0.028nm at 40nm
easyLIGHT (XUV) 30 to 250 ~2.0nm/mm <0.1nm
highLIGHT(XUV) 1 to 100 - <0.1nm
maxLIGHT (VUV) 40 to 200 0.9 to   1.6nm/mm <0.05nm at 120nm
easyLIGHT (VUV) 80 to  300 ~2.5nm/mm <0.1nm
X-Ray Spectroscopy 
2-4 keV   0.3eV
Extended X-ray Spectroscopy 5-12keV    
Near Edge X-ray absorption 
200 - 1200eV
   

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