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Products / SIMTRUM's Products /Other Systems /Maskless Lithography UV Laser Writer / UV Laser Writer - Maskless Lithography BEAM Lite /

Maskless Lithography UV Direct Laser Writer system, minimum linewidth 3µm guaranteed, 2 µm achievable, minimum pitch 4 µm achievable, exposure time < 2 s for 1 writefield, maximum writefield 800 µm ✕ 800 µm, laser power 40mW, laser wavelength 375/405nm

MODEL:UV Laser Writer - Maskless Lithography BEAM Lite

6-10 Weeks Drawings

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* The prices are indicative only. Please contact us for an official quote. This is single product page, for detail specification please refer to product main page

Compatible

Compare	Model		Drawings & Specs	Availability	Reference Price

Product Specification

Parameters		BEAM	BEAM Lite
Minimum Linewidth最小线宽		2 µm guaranteed, 0.8 µm achievable (0.8µm可实现）	3 µm guaranteed, 2 µm achievable (2µm可实现)
Minimum Pitch 最小间距		1.6 µm achievable(可达到1.6 µm）	4 µm achievable (可达到4 µm)
Exposure Time 曝光时间		< 2 s for 1 writefield（1个图案<2s)
Maximum Writefield 最大写场		400 µm ✕ 400 µm	800 µm ✕ 800 µm
Laser Power 激光能量		40mW(Customizble可定制)
Laser Wavelength 激光波长		405 nm	375/405 nm
Laser Galvo 激光振镜	Step Size 步径	8 nm
	Repeatability 重复性	< 100 nm (static)
	Speed 速度	up to 200 mm/s
Motorized Stepper 电动平台	Encoder Resolution 编辑器分辨率	0.1 µm
	Stage Repeatability (1σ)载物台重复性	Better than 0.3 µm (优于 0.3 µm)
	Movement Area 移动区域	120 mm ✕ 120 mm
Largest Sample Size 最大样本尺寸		130 mm ✕ 130 mm (> 5”)
Wafer Alignment 晶圆对齐		Multilayer processes supported 支持多层工艺	Single-layer processes supported* 支持单层工艺*
Accepted File Formats 接受的文件格式		.bmp, .png, .tiff, .gds, Custom shapes can directly be drawn in software. 自定义形状可以直接在软件中绘制
Software 软件	Patterning 图案	Nanyte BEAM Xplorer
	Design 设计	KLayout (most powerful最强大), MS Paint/Powerpoint (rapid prototyping快速原型设计)
Weight 重量		Lighter than 20 kg 少于20公斤
System Size 系统尺寸		330 ✕ 310 ✕ 340 mm

* For more information about upgrading to Multilayer Processes, please contact us. 可升级为支持多层工艺，请联系我们了解更多资讯。

Front View

Back View

Modular Laser Head

Swappable optics minimizes downtime and increases upgradeability.

可更换的光学元件可最大限度地减少停机时间并提高可升级性。

Customization options are available for different wavelengths and write

field sizes. Contact us info@simtrum.comfor more info.

定制选项可用于不同的波长和写场大小。联系我们 info@simtrum.com

了解更多信息。

System Requirements

Power 功率

BEAM opeartes on 100-240 VAC 50-60j Hz. Line voltage and frequency are automatically sensed; therefore, no swithces are to be set. Check that the operating voltagein your area is compatible. BEAM 在 100-240 VAC 50-60j Hz 上运行。自动感应线路电压和频率；因此，无需设置任何开关。检查您所在地区的工作电压是否兼容。

Location 放置环境

● Indoor, dust free, near-non-conductive pollution (degree 2 of EN61010-1:2010) 室内、无尘、近非导电污染（EN61010-1:2010 2 级）

● Tabletop vibration should be kept under VC-A (50 um/s) 桌面振动应保持在 VC-A (50 um/s) 以下

● Cleanroom environment is optional 非超净间环境下可使用 (Vibration Reference link)

● Equipment must be shaded from indirect sunlight 设备必须避免阳光直射

● Relative humidity < 80% (no condensation) 相对湿度 < 80%（无冷凝）

UV Laser Writer - Maskless Lithography BEAM Lite - Parameter

UV Laser Writer - Maskless Lithography BEAM - Parameter

UV Laser Writer - Maskless Lithography BEAM Lite - Download

UV Laser Writer - Maskless Lithography BEAM - Download

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